Surface oxidation of Si(111) by high purity ozone and negative ions produced by Rydberg electron transfer

H. Nonaka, A. Kurokawa, K. Nakamura, S. Ichimura

研究成果: Conference article査読

1 被引用数 (Scopus)

抄録

The sub-initial oxidation of Si (111) surface by a high-flux pure ozone was investigated using X-ray photoelectron spectroscopy. In addition to the advantage of the pure ozone which can efficiently oxidize the Si surface at room temperature, the high-flux ozone was found to further enhance the oxidation. The possibility of producing negative ions of oxidizing gases using Rydberg electron transfer was also investigated.

本文言語English
ページ(範囲)53-58
ページ数6
ジャーナルMaterials Research Society Symposium - Proceedings
446
出版ステータスPublished - 1997 1 1
外部発表はい
イベントProceedings of the 1996 MRS Fall Meeting - Boston, MA, USA
継続期間: 1996 12 21996 12 5

ASJC Scopus subject areas

  • Materials Science(all)
  • Condensed Matter Physics
  • Mechanics of Materials
  • Mechanical Engineering

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