Survey of the metal nucleation processes on silicon surfaces in fluoride solutions: From dilute HF to concentrated NH₄F solutions

Engineering & Materials Science

• Nucleation 100%
• Silicon 75%
• Metals 61%
• ULSI circuits 53%
• Corrosion 47%
• Substrates 44%
• Electrochemical cells 44%
• Precious metals 41%
• Surface defects 38%
• Microscopic examination 34%
• Crystals 31%
• Contamination 30%
• Impurities 30%
• Networks (circuits) 17%

Chemical Compounds

• Nucleation 78%
• Fluoride 77%
• Corrosion 68%
• Surface Defect 56%
• Open Circuit Potential 53%
• Trace Metal 53%
• Electrochemical Cell 51%
• Noble Metal 45%
• Metal 42%
• Force 32%
• Surface 30%