Synergistic enhancement of direct synchrotron radiation etching of a resist by a low-energy oxygen beam

Hiroshi Murakami, Shingo Ichimura, Hazime Shimizu, Isao Kudo, Nobufumi Atoda

研究成果: Article査読

1 被引用数 (Scopus)

抄録

The effect of the simultaneous irradiation of a low-energy oxygen ion beam with synchrotron radiation (SR) was investigated. The purpose was the enhancement of the direct resist etching by SR. Although the removal by sputtering of the resist was observed due to the wide energy width of the ion beam used, it was confirmed that the net SR etching, which was estimated after subtraction of the sputtering contribution, increased about two times. Possibilities for the enhancement of this “synergistic effect” induced by low-energy ion beam bombardment to improve the direct SR etching and make it more practical are also discussed.

本文言語English
ページ(範囲)L1774-L1776
ジャーナルJapanese journal of applied physics
26
11 A
DOI
出版ステータスPublished - 1987 11
外部発表はい

ASJC Scopus subject areas

  • Engineering(all)
  • Physics and Astronomy(all)

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