抜粋
A polyorganosiloxane retaining a SiO4 tetrahedral framework has been synthesized by the reaction of an inosilicate mineral (para-wollastonite) with a trimethylsilylating reagent. The glassy product dissolved in a wide range of organic solvents but was insoluble in water. The analyses of the product by means of infra-red spectroscopy, X-ray powder diffraction and elemental analysis indicated that trimethylsilyl side groups were linked to the SiO4 framework. The thermal stability of the product was determined by thermal analysis.
| 元の言語 | English |
|---|---|
| ページ（範囲） | 1300-1302 |
| ページ数 | 3 |
| ジャーナル | Polymer |
| 巻 | 19 |
| 発行部数 | 11 |
| DOI | |
| 出版物ステータス | Published - 1978 11 |
ASJC Scopus subject areas
- Organic Chemistry
- Polymers and Plastics
- Materials Chemistry
フィンガープリント Synthesis of polyorganosiloxane retaining SiO<sub>4</sub> framework from inosilicate mineral by trimethylsilylation' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。
これを引用
Kuroda, K., & Kato, C. (1978). Synthesis of polyorganosiloxane retaining SiO4 framework from inosilicate mineral by trimethylsilylation. Polymer, 19(11), 1300-1302. https://doi.org/10.1016/0032-3861(78)90309-9