Systematic calibration procedure of process parameters for electromagnetic field analysis of millimeter-wave CMOS devices

K. Takano, K. Katayama, S. Mizukusa, S. Amakawa, T. Yoshida, M. Fujishima

研究成果: Conference contribution

7 被引用数 (Scopus)

抄録

This work proposed the systematic calibration method of process parameters for electromagnetic analysis of CMOS back-end devices in millimeter-wave and THz frequencies. It uses the propagation constants of transmission lines in all the measurement frequency and the RLGC model parameters in low frequency as the objective variables of the parameter fitting. It was showed that the EM simulation results using calibrated process parameters were in good agreement with the measurement results up to 330 GHz.

本文言語English
ホスト出版物のタイトルICMTS 2015 - Proceedings of the 2015 IEEE International Conference on Microelectronic Test Structures
出版社Institute of Electrical and Electronics Engineers Inc.
ページ230-234
ページ数5
ISBN(電子版)9781479983025
DOI
出版ステータスPublished - 2015 5 12
外部発表はい
イベント2015 IEEE International Conference on Microelectronic Test Structures, ICMTS 2015 - Tempe, United States
継続期間: 2015 3 232015 3 26

出版物シリーズ

名前IEEE International Conference on Microelectronic Test Structures
2015-May

Other

Other2015 IEEE International Conference on Microelectronic Test Structures, ICMTS 2015
国/地域United States
CityTempe
Period15/3/2315/3/26

ASJC Scopus subject areas

  • 電子工学および電気工学

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