TEM analysis on nanovoid formation in annealed amorphous oxides

Ryusuke Nakamura*, Takehiro Shudo, Akihiko Hirata, Manabu Ishimaru, Hideo Nakajima

*この研究の対応する著者

研究成果: Conference contribution

抄録

Formation behavior of nanovoids during the annealing of amorphous Al 2O3 and WO3 was studied by transmission electron microscopy. The density and size of the voids in Al2O 3 and WO3 increase with increasing annealing temperature from 973 to 1123 K and from 573 to 673 K, respectively. It is suggested that the formation of nanovoids during annealing is attributed to the large difference in density between as-deposited amorphous and crystalline oxides.

本文言語English
ホスト出版物のタイトルEco-Materials Processing and Design XII
出版社Trans Tech Publications Ltd
ページ541-544
ページ数4
ISBN(印刷版)9783037852224
DOI
出版ステータスPublished - 2011
外部発表はい

出版物シリーズ

名前Materials Science Forum
695
ISSN(印刷版)0255-5476
ISSN(電子版)1662-9752

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学

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