抄録
Co-Al-O film was fabricated using the reactive r.f. magnetron sputtering technique. A maximum magnetoresistance (MR) of approximately 7% was established through optimizing the sputter deposition conditions such as sputter power and gas flow rate. TEM characterization of the film revealed a nano-granular structure that consisted of ferromagnetic grains with grain diameters on the order of several nm together with non-magnetic grain boundary layers with the thickness on the order of less than 1 nm. The large MR was attributed to electron tunneling thorough this very thin grain boundary layer between individual ferromagnetic grains.
本文言語 | English |
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ページ(範囲) | 569-574 |
ページ数 | 6 |
ジャーナル | Journal of Materials Science: Materials in Medicine |
巻 | 12 |
号 | 10 |
DOI | |
出版ステータス | Published - 2001 10月 |
外部発表 | はい |
ASJC Scopus subject areas
- 電子工学および電気工学
- 材料科学(全般)
- 電子材料、光学材料、および磁性材料
- 凝縮系物理学