TEM characterization of Co-Al-O nano-granular TMR film

K. Kamei*, M. Yonemura, K. Hanafusa

*この研究の対応する著者

研究成果: Article査読

3 被引用数 (Scopus)

抄録

Co-Al-O film was fabricated using the reactive r.f. magnetron sputtering technique. A maximum magnetoresistance (MR) of approximately 7% was established through optimizing the sputter deposition conditions such as sputter power and gas flow rate. TEM characterization of the film revealed a nano-granular structure that consisted of ferromagnetic grains with grain diameters on the order of several nm together with non-magnetic grain boundary layers with the thickness on the order of less than 1 nm. The large MR was attributed to electron tunneling thorough this very thin grain boundary layer between individual ferromagnetic grains.

本文言語English
ページ(範囲)569-574
ページ数6
ジャーナルJournal of Materials Science: Materials in Medicine
12
10
DOI
出版ステータスPublished - 2001 10
外部発表はい

ASJC Scopus subject areas

  • 電子工学および電気工学
  • 材料科学(全般)
  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学

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