Temperature Characteristics of ScAlN/SiO2 BAW Resonators

Honoka Igeta, Makoto Totsuka, Masashi Suzuki, Takahiko Yanagitani

研究成果: Conference article査読

2 被引用数 (Scopus)

抄録

The electromechanical coupling coefficient kt2, TCF and Qm factor of the stack structure of ScAlN/SiCh or ScAlN/diamond BAW film resonators were simulated to compare with conventional single layer A1N films, kt2 of A1N films is not enough for BAW RF filter applications. ScAIN films have kt2 exceeding A1N films, but Qm factor deteriorate with Sc doping. We experimentally investigated TCF of ScxAli-xN films with various Sc concentration. By using the experiment TCF, Simulated results shows that ScAlN/SiCh BAW film resonators obtain higher kt2 than one of A1N with good TCF. The Qm factor and TCF of ScAlN/diamond BAW film resonators were improved, whereas the kt2 was seriously decreased compared with single layer A1N. Therefore, the ScAlN/SiCh BAW film resonators may be promising combination for BAW RF filter applications.

本文言語English
論文番号8580165
ジャーナルIEEE International Ultrasonics Symposium, IUS
2018-January
DOI
出版ステータスPublished - 2018
外部発表はい
イベント2018 IEEE International Ultrasonics Symposium, IUS 2018 - Kobe, Japan
継続期間: 2018 10 222018 10 25

ASJC Scopus subject areas

  • Acoustics and Ultrasonics

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