Tensor evaluation of anisotropic stress relaxation in mesa-shaped sige layer on si substrate by electron back-scattering pattern measurement: Comparison between raman measurement and finite element method simulation

Motohiro Tomita, Masaya Nagasaka, Daisuke Kosemura, Koji Usuda, Tsutomu Tezuka, Atsushi Ogura

研究成果: Article査読

3 被引用数 (Scopus)

フィンガープリント 「Tensor evaluation of anisotropic stress relaxation in mesa-shaped sige layer on si substrate by electron back-scattering pattern measurement: Comparison between raman measurement and finite element method simulation」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

Engineering & Materials Science

Physics & Astronomy