The effects of UV irradiation on titania deposition from titanium tetra-isopropoxide

Yasuyuki Egashira, Masato Sugimachi, Kouichi Nishizawa, Kazunobu Saito, Toshio Ohsawa, Hiroshi Komiyama

研究成果: Article

4 引用 (Scopus)

抜粋

The influence of UV irradiation on the deposition of titania from titanium tetra-isopropoxide (TTIP) under reduced pressure was studied. It was found that UV irradiation accelerates the titania growth rate by a factor of 2-3 in the temperature range of 573 to 623 K. The coverage quality of micron-size trenches in the cases with and without UV irradiation indicates the role of the photo-enhanced surface reaction. The threshold wavelength of 380 nm which is equivalent to the energy gap of anatase indicates strongly that band-to-band excitation is responsible for the photo-enhanced surface reaction.

元の言語English
ページ(範囲)389-392
ページ数4
ジャーナルApplied Surface Science
79-80
発行部数C
DOI
出版物ステータスPublished - 1994 5 2
外部発表Yes

    フィンガープリント

ASJC Scopus subject areas

  • Surfaces, Coatings and Films

これを引用

Egashira, Y., Sugimachi, M., Nishizawa, K., Saito, K., Ohsawa, T., & Komiyama, H. (1994). The effects of UV irradiation on titania deposition from titanium tetra-isopropoxide. Applied Surface Science, 79-80(C), 389-392. https://doi.org/10.1016/0169-4332(94)90442-1