The influence of low-temperature annealing on the physical properties of bi₂sr₂cacu₂cl y thin films

Engineering & Materials Science

• Partial pressure 100%
• Annealing 83%
• Thin films 79%
• Physical properties 75%
• Oxygen 68%
• Core levels 44%
• Ligands 37%
• Magnetron sputtering 37%
• X ray photoelectron spectroscopy 34%
• Temperature 33%
• Atoms 29%
• Substrates 19%
• Air 15%

Physics & Astronomy

• partial pressure 81%
• physical properties 66%
• oxygen 50%
• annealing 50%
• thin films 43%
• ligands 28%
• magnetron sputtering 23%
• shift 16%
• air 16%
• atoms 14%

Chemical Compounds

• Partial Pressure 80%
• Annealing 66%
• Dioxygen 41%
• Core Level 33%
• Magnetron Sputtering 32%
• Liquid Film 13%
• Ligand 12%