The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and kt 2 of the Scaln Films

Yuka Endo, Rei Karasawa, Shinji Takayanagi, Makoto Imakawa, Keisuke Morisaka, Yu Suzuki, Takahiko Yanagitani

    研究成果: Conference contribution

    1 引用 (Scopus)

    抜粋

    Film Bulk Acoustic Resonator (FBAR) will become commonplace for the frequency filter used in mobile communication. AIN films were used for piezoelectric material of FBAR. High piezoelectricity of ScAlN films have attracted much attention as FBAR material. However, negative ion generation at Sc metal target induces degradation of the crystallinity due to the ion bombardment on ScAlN films during the sputtering growth. Large amount of O- and CN-ions generation at sputtering target were observed. In this study, we compared the energy distributions of negative ions of arc-melted and sintered ScAl alloy targets which have different oxygen and carbon concentration. The c-axis orientation and electromechanical coupling coefficient kt2of ScAlN films fabricated with these different targets were also compared. As a result, the kt2of two targets was larger than our previous report. There were the large differences in amount of O- and CN- ions generation in the two targets. However, it does not significantly affect the results of the crystallization and kt2of the ScAlN films.

    元の言語English
    ホスト出版物のタイトル2018 IEEE International Ultrasonics Symposium, IUS 2018
    出版者IEEE Computer Society
    2018-October
    ISBN(電子版)9781538634257
    DOI
    出版物ステータスPublished - 2018 12 17
    イベント2018 IEEE International Ultrasonics Symposium, IUS 2018 - Kobe, Japan
    継続期間: 2018 10 222018 10 25

    Other

    Other2018 IEEE International Ultrasonics Symposium, IUS 2018
    Japan
    Kobe
    期間18/10/2218/10/25

    ASJC Scopus subject areas

    • Acoustics and Ultrasonics

    フィンガープリント The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and k<sub>t</sub> <sup>2</sup> of the Scaln Films' の研究トピックを掘り下げます。これらはともに一意のフィンガープリントを構成します。

  • これを引用

    Endo, Y., Karasawa, R., Takayanagi, S., Imakawa, M., Morisaka, K., Suzuki, Y., & Yanagitani, T. (2018). The Influence of Negative Ions Generation on the Arc-Melted and Hot Press Sintered Scal Alloy Targets to the Crystalline Orientation and kt 2 of the Scaln Films. : 2018 IEEE International Ultrasonics Symposium, IUS 2018 (巻 2018-October). [8579841] IEEE Computer Society. https://doi.org/10.1109/ULTSYM.2018.8579841