Thermal annealing behavior of defects induced by ion implantation in thermally grown SiO2 films
Kwang Soo Seol*, Toshifumi Karasawa, Yoshimichi Ohki, Hiroyuki Nishikawa, Makoto Takiyama
*この研究の対応する著者
研究成果: Article › 査読
6
被引用数
(Scopus)