Thermal boundary resistance of W/Al2O3 interface in W/Al2O3/W three-layered thin film and its dependence on morphology

Shizuka Kawasaki, Yuichiro Yamashita*, Nobuto Oka, Takashi Yagi, Junjun Jia, Naoyuki Taketoshi, Tetsuya Baba, Yuzo Shigesato

*この研究の対応する著者

研究成果: Article査読

7 被引用数 (Scopus)

抄録

We investigated the dependence of the thermal boundary resistance of the W/Al2O3 interface in W/Al2O3/W three-layered thin films on the interface morphology. The layered structures, Al2O3 thin layers with thicknesses from 1 to 50nm covered by top and bottom W layers with a thickness of 100 nm, were fabricated by magnetron sputtering using a W target (99.99%) and an Al2O 3 target (99.99%). The fabrication of polycrystalline W and amorphous Al2O3 films was confirmed by structural analysis. The morphology of the bottom W layer/Al2O3 layer and Al 2O3 layer/top W layer interfaces showed a wavelike structure with a roughness of about 1 nm. Thermophysical properties and thermal boundary resistance were measured by a pulsed light heating thermoreflectance technique. The thermal boundary resistance of the W/Al2O3 interface was 1.9 × 10-9 m2KW-1, which corresponds to the thermal resistance of a 3.7-nm-thick Al2O 3 film or a 120-nm-thick W film.

本文言語English
論文番号065802
ジャーナルJapanese journal of applied physics
52
6 PART 1
DOI
出版ステータスPublished - 2013 6月 1
外部発表はい

ASJC Scopus subject areas

  • 工学(全般)
  • 物理学および天文学(全般)

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