Thickness control of 3-dimensional mesoporous silica ultrathin films by wet-etching

Maho Kobayashi, Kyoka Susuki, Tomohiro Otani, Shinpei Enomoto, Haruo Otsuji, Yoshiyuki Kuroda, Hiroaki Wada, Atsushi Shimojima, Takayuki Homma, Kazuyuki Kuroda

    研究成果: Article

    9 引用 (Scopus)

    抜粋

    The thickness of 3-dimensional (3D) mesoporous silica ultrathin films was controlled at a single-nanometer scale by wet-etching. A drop casting method with an aqueous etchant of ammonium fluoride was effective in etching the surfaces of films in the direction perpendicular to their substrates. The decrease in the film thickness depends on the interface tension of etching solutions. The wettability of thin films also influences the etching. CoPt nanodots were electrodeposited within ultrathin silica films on Ru substrates to form CoPt nanodot patterns.

    元の言語English
    ページ(範囲)8321-8329
    ページ数9
    ジャーナルNanoscale
    9
    発行部数24
    DOI
    出版物ステータスPublished - 2017 6 28

    ASJC Scopus subject areas

    • Materials Science(all)

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