Thickness control of 3-dimensional mesoporous silica ultrathin films by wet-etching

Maho Kobayashi, Kyoka Susuki, Tomohiro Otani, Shinpei Enomoto, Haruo Otsuji, Yoshiyuki Kuroda, Hiroaki Wada, Atsushi Shimojima, Takayuki Homma, Kazuyuki Kuroda

研究成果: Article査読

10 被引用数 (Scopus)

抄録

The thickness of 3-dimensional (3D) mesoporous silica ultrathin films was controlled at a single-nanometer scale by wet-etching. A drop casting method with an aqueous etchant of ammonium fluoride was effective in etching the surfaces of films in the direction perpendicular to their substrates. The decrease in the film thickness depends on the interface tension of etching solutions. The wettability of thin films also influences the etching. CoPt nanodots were electrodeposited within ultrathin silica films on Ru substrates to form CoPt nanodot patterns.

本文言語English
ページ(範囲)8321-8329
ページ数9
ジャーナルNanoscale
9
24
DOI
出版ステータスPublished - 2017 6 28

ASJC Scopus subject areas

  • Materials Science(all)

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