Three-dimensional lithography for rutile TiO2 single crystals using swift heavy ions

Koichi Awazu, Makoto Fujimaki, Yoshimichi Ohki, Tetsuro Komatsubara

研究成果: Conference article査読

抄録

We have developed a nano-micro structure fabrication method in rutile TiO2 single crystal by use of swift heavy-ion irradiation. The area where ions heavier than Cl ion accelerated with MeV-order high energy were irradiated was well etched by hydrofluoric acid, by comparison etching was not observed in the pristine TiO2 single crystal. Noticed that the irradiated area could be etched to a depth at which the electronic stopping power of the ion decayed to a value of 6.2keV/nm. We also found that the value of the electronic stopping power was increased, eventually decreased against depth in TiO2 single crystal with, e.g. 84.5MeV Ca ion. Using such a beam, inside of TiO2 single crystal was selectively etched with 20% hydrofluoric acid, while the top surface of TiO2 single crystal subjected to irradiation was not etched. Roughness of the new surface created in the single crystal was within 7nm with the atomic forth microscopy measurement.

本文言語English
ページ(範囲)69-74
ページ数6
ジャーナルMaterials Research Society Symposium - Proceedings
797
DOI
出版ステータスPublished - 2003
イベントEngineered Porosity for Microphotonics and Plasmonics - Boston, MA., United States
継続期間: 2003 12 22003 12 4

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学

フィンガープリント

「Three-dimensional lithography for rutile TiO<sub>2</sub> single crystals using swift heavy ions」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル