Three-dimensional micro-structures consisting of high aspect ratio inclined micro-pillars fabricated by simple photolithography

H. Sato*, Y. Houshi, S. Shoji

*この研究の対応する著者

研究成果: Article査読

18 被引用数 (Scopus)

抄録

This paper presents a fabrication method of three-dimensional micro-structures consisting of high aspect ratio inclined micro-pillars using simple photolithography. The width and height of micro-pillars were 10 um and 200 μm (the aspect ratio was about 20). The SU-8 coated on the Cr patterned Pyrex glass substrate was exposed from the backside with an angle to fabricate inclined micro-pillars. The 3-D micro-structures were fabricated by repeating the backside exposure with different angles. The shape of the micro-structure was denned by the number of exposures and the UV irradiation angles. The complicated micro-structures were fabricated by multi-angle exposures around two axes, as well as around one axis.

本文言語English
ページ(範囲)440-443
ページ数4
ジャーナルMicrosystem Technologies
10
6-7
DOI
出版ステータスPublished - 2004 10 1

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学
  • ハードウェアとアーキテクチャ
  • 電子工学および電気工学

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