Three-dimensional silicon fabrication using microloading effects with a rectangular aperture mask

Tomoyuki Takahata*, Eiji Iwase, Kiyoshi Matsumoto, Isao Shimoyama

*この研究の対応する著者

研究成果: Article査読

5 被引用数 (Scopus)

抄録

Three-dimensional silicon fabrication is demanded in optical lenses for collecting far infrared radiation. We propose a method for the fabrication of shapes, which have depths varying in the x and y directions, vertical walls and smooth surfaces. A mask design with rectangular apertures was used in a two-stage etching process consisting of anisotropic etching to rough out the three-dimensional shape followed by isotropic etching to smooth the surface. The relationship between the etching depth and area and the aspect ratio (length-to-height ratio) of the rectangular apertures was determined experimentally. Based on this relationship, we describe a procedure for designing rectangular apertures. We fabricated a convex microlens with a diameter of 150 μm and a height of 4.3 μm surrounded by a vertical wall. The arithmetic mean surface roughness of the microlens was 100 nm.

本文言語English
論文番号075022
ジャーナルJournal of Micromechanics and Microengineering
20
7
DOI
出版ステータスPublished - 2010 6月 29
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 材料力学
  • 機械工学
  • 電子工学および電気工学

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