Time-resolved photoluminescence study of hydrogenated amorphous silicon nitride

Kwang Soo Seol, Takashi Watanabe, Makoto Fujimaki, Hiromitsu Kato, Yoshimichi Ohki

研究成果: Article査読

25 被引用数 (Scopus)

抄録

Time-resolved measurements of photoluminescence were carried out on a hydrogenated amorphous silicon nitride film prepared by low-pressure chemical vapor deposition. When excited with 5.0-eV photons, photoluminescence occurs over a broad spectrum ranging from 1.8 to 3.6 eV. The peak energy of this photoluminescence varies with time from several nanoseconds to nearly 1 ms. These results are explained by a combination of an excitonlike recombination process and a radiative tunneling recombination process of photogenerated carriers within the band-tail states, which are affected by the contributions of thermalization, the Coulombic interaction, and the extent of localization.

本文言語English
ページ(範囲)1532-1535
ページ数4
ジャーナルPhysical Review B - Condensed Matter and Materials Physics
62
3
DOI
出版ステータスPublished - 2000

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 凝縮系物理学

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