TOC removal of raw industrial wastewater from LSI photo-resist processing with H2O2/UV in a batch reactor

W. J. Hou, S. Tsuneda, A. Hirata*

*この研究の対応する著者

研究成果: Article査読

5 被引用数 (Scopus)

抄録

The raw industrial wastewater from LSI photo-resist processing which contains 1,2-naphthoquinone-2-diazido-5-sulfonic acid sodium salt as a main component with high NaCl concentration (>20 kg/m3), is very difficult to treat. The establishment of an appropriate treatment, which is friendly to the earth's environment for raw industrial wastewater is an urgent matter to be solved. Total organic carbon (TOC) removal of the raw industrial wastewater, which contains TOC at 8000 g-TOC/m3, by using hydrogen peroxide and ultraviolet irradiation (H2O2/UV), has been carried out. Experiments were carried out in a batch reactor with a low pressure UV lamp (500 W) irradiating ultraviolet at 254 nm and at 185 nm (5%). The chemical compounds included in the raw industrial wastewater have been removed completely in the presence of initial concentration of hydrogen peroxide of two times the stoichiometric ratio.

本文言語English
ページ(範囲)444-447
ページ数4
ジャーナルJOURNAL OF CHEMICAL ENGINEERING OF JAPAN
34
3
DOI
出版ステータスPublished - 2001 3 1

ASJC Scopus subject areas

  • 化学 (全般)
  • 化学工学(全般)

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