Topographical and Electrochemical Characterization of Optically Smooth Zn Films Prepared by Physical Vapor Deposition

Yu Luo*, Nelson Yee, Qingfang Shi, Baoxin Zhang, Yibo Mo, Gary S. Chottiner, Daniel Alberto Scherson

*この研究の対応する著者

研究成果: Article査読

1 被引用数 (Scopus)

抄録

Optically smooth Zn films supported on Cu-coated glass and quarts substrates have been obtained by physical vapor deposition of Zn in metallic form. The method employed involves resistive heating of a Mo boat filled with high purity Zn shot in an Ar atmosphere at pressures of about 3-5 mTorr. Atomic force microscopy images revealed that the resulting Zn deposits consist of smooth features (rms roughness ca. 0.3 nm) with dimensions on the order of 200 nm. Preliminary results indicate that the electrochemical behavior of these films in strongly alkaline solutions is somewhat different than that observed for Zn in bulk commercial form.

本文言語English
ジャーナルJournal of the Electrochemical Society
148
7
DOI
出版ステータスPublished - 2001 7 1
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 再生可能エネルギー、持続可能性、環境
  • 表面、皮膜および薄膜
  • 電気化学
  • 材料化学

フィンガープリント

「Topographical and Electrochemical Characterization of Optically Smooth Zn Films Prepared by Physical Vapor Deposition」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル