Toward a systematic methodology for modeling vapor deposition processes

Yuya Kajikawa*, Hideki Mima, Katsumori Matsushima, Suguru Noda, Hiroshi Komiyama

*この研究の対応する著者

研究成果: Paper査読

抄録

Vapor deposition is a complex process that includes gas-phase, surface, and solid-phase phenomena. Because of the complexity of the chemical and physical processes occurring in the vapor deposition process, it is difficult to form a comprehensive understanding and to control such systems to obtain the desirable structures, properties, and performance. To overcome these difficulties, a systematic methodology is necessary. In this work, we propose a systems approach to distinguish essential processes from other non-essential chemical and physical processes. We illustrate the systems approach using preferred orientation as an example. We also report our recent efforts to extract existing knowledge efficiently from the huge amounts of literature, using natural language processing (NLP). Our tools can support the literature-survey process that has traditionally been time consuming. Causal knowledge extraction from the literature is demonstrated with NLP.

本文言語English
ページ29-35
ページ数7
出版ステータスPublished - 2005
外部発表はい
イベント15th European Conference on Chemical Vapor Deposition, EUROCVD-15 - Bochum, Germany
継続期間: 2005 9 52005 9 9

Conference

Conference15th European Conference on Chemical Vapor Deposition, EUROCVD-15
国/地域Germany
CityBochum
Period05/9/505/9/9

ASJC Scopus subject areas

  • 工学(全般)

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