抄録
Nano-/micro-scale structures of transparent crosslinked polytetrafluoroethylene (RX-PTFE) mold have been fabricated by combined process which is thermal and radiation process for fabrication of RX-PTFE (TRaf process). The nano-/micro-fabricated RX-PTFE were attempted to be applied for the transparent polymer molds of UV nanoimprint lithography (NIL). The ability of the RX-PTFE mold for UV-NIL was evaluated by the imprinted patterns. The RX-PTFE molds and the imprinted structures obtained by UV-NIL were observed by a field emission scanning electron microscope (FE-SEM). As a result, imprinted structures of photo-curable resin (Trimethylolpropane-triacrylate: TMPTA) by UV-NIL using RX-PTFE mold were successfully obtained. The nano-scale L&S patterns, square (410 nm × 410 nm) and hole (Φ{phonetic} 170 nm) array patterns were clearly obtained.
| 本文言語 | English |
|---|---|
| ページ（範囲） | 217-221 |
| ページ数 | 5 |
| ジャーナル | Journal of Photopolymer Science and Technology |
| 巻 | 25 |
| 号 | 2 |
| DOI | |
| 出版ステータス | Published - 2012 |
ASJC Scopus subject areas
- ポリマーおよびプラスチック
- 有機化学
- 材料化学