抄録
Nano-/micro-scale structures of transparent crosslinked polytetrafluoroethylene (RX-PTFE) mold have been fabricated by combined process which is thermal and radiation process for fabrication of RX-PTFE (TRaf process). The nano-/micro-fabricated RX-PTFE were attempted to be applied for the transparent polymer molds of UV nanoimprint lithography (NIL). The ability of the RX-PTFE mold for UV-NIL was evaluated by the imprinted patterns. The RX-PTFE molds and the imprinted structures obtained by UV-NIL were observed by a field emission scanning electron microscope (FE-SEM). As a result, imprinted structures of photo-curable resin (Trimethylolpropane-triacrylate: TMPTA) by UV-NIL using RX-PTFE mold were successfully obtained. The nano-scale L&S patterns, square (410 nm × 410 nm) and hole (Φ{phonetic} 170 nm) array patterns were clearly obtained.
| 元の言語 | English |
|---|---|
| ページ（範囲） | 217-221 |
| ページ数 | 5 |
| ジャーナル | Journal of Photopolymer Science and Technology |
| 巻 | 25 |
| 発行部数 | 2 |
| DOI | |
| 出版物ステータス | Published - 2012 |
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ASJC Scopus subject areas
- Materials Chemistry
- Polymers and Plastics
- Organic Chemistry
これを引用
Transparent crosslinked PTFE mold fabrication and nano-/micro-pattern transfer to photo-curable resin. / Kobayashi, Akinobu; Oyama, Tomoko Gowa; Oshima, Akihiro; Tagawa, Seiichi; Washio, Masakazu.
：: Journal of Photopolymer Science and Technology, 巻 25, 番号 2, 2012, p. 217-221.研究成果: Article
}
TY - JOUR
T1 - Transparent crosslinked PTFE mold fabrication and nano-/micro-pattern transfer to photo-curable resin
AU - Kobayashi, Akinobu
AU - Oyama, Tomoko Gowa
AU - Oshima, Akihiro
AU - Tagawa, Seiichi
AU - Washio, Masakazu
PY - 2012
Y1 - 2012
N2 - Nano-/micro-scale structures of transparent crosslinked polytetrafluoroethylene (RX-PTFE) mold have been fabricated by combined process which is thermal and radiation process for fabrication of RX-PTFE (TRaf process). The nano-/micro-fabricated RX-PTFE were attempted to be applied for the transparent polymer molds of UV nanoimprint lithography (NIL). The ability of the RX-PTFE mold for UV-NIL was evaluated by the imprinted patterns. The RX-PTFE molds and the imprinted structures obtained by UV-NIL were observed by a field emission scanning electron microscope (FE-SEM). As a result, imprinted structures of photo-curable resin (Trimethylolpropane-triacrylate: TMPTA) by UV-NIL using RX-PTFE mold were successfully obtained. The nano-scale L&S patterns, square (410 nm × 410 nm) and hole (Φ{phonetic} 170 nm) array patterns were clearly obtained.
AB - Nano-/micro-scale structures of transparent crosslinked polytetrafluoroethylene (RX-PTFE) mold have been fabricated by combined process which is thermal and radiation process for fabrication of RX-PTFE (TRaf process). The nano-/micro-fabricated RX-PTFE were attempted to be applied for the transparent polymer molds of UV nanoimprint lithography (NIL). The ability of the RX-PTFE mold for UV-NIL was evaluated by the imprinted patterns. The RX-PTFE molds and the imprinted structures obtained by UV-NIL were observed by a field emission scanning electron microscope (FE-SEM). As a result, imprinted structures of photo-curable resin (Trimethylolpropane-triacrylate: TMPTA) by UV-NIL using RX-PTFE mold were successfully obtained. The nano-scale L&S patterns, square (410 nm × 410 nm) and hole (Φ{phonetic} 170 nm) array patterns were clearly obtained.
KW - Crosslinked PTFE
KW - TRaf process
KW - Transparent polymer mold
KW - UV-NIL
UR - http://www.scopus.com/inward/record.url?scp=84864967643&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=84864967643&partnerID=8YFLogxK
U2 - 10.2494/photopolymer.25.217
DO - 10.2494/photopolymer.25.217
M3 - Article
AN - SCOPUS:84864967643
VL - 25
SP - 217
EP - 221
JO - Journal of Photopolymer Science and Technology
JF - Journal of Photopolymer Science and Technology
SN - 0914-9244
IS - 2
ER -