Triple nitrogen-vacancy centre fabrication by C₅N₄H _n ion implantation

Moriyoshi Haruyama, Shinobu Onoda^*, Taisei Higuchi, Wataru Kada, Atsuya Chiba, Yoshimi Hirano, Tokuyuki Teraji, Ryuji Igarashi, Sora Kawai, Hiroshi Kawarada, Yu Ishii, Ryosuke Fukuda, Takashi Tanii, Junichi Isoya, Takeshi Ohshima, Osamu Hanaizumi