@article{617c2168cb4a4402ba1271edc0e11139,
title = "Ultrafast production of silicon via aluminothermic reduction of tetrachlorosilane in a thermal plasma jet",
abstract = "This paper proposed a new route for producing silicon at a high rate via the reduction of tetrachlorosilane with aluminum molten particles by utilizing a thermal plasma jet. High-purity aluminum particles melted and sprayed by an atmospheric dc plasma jet were reacted with tetrachlorosilane vapor. Silicon generation was confirmed in the reacted particles. The residence time was calculated to be a few milliseconds. The obtained results demonstrate the feasibility of the aluminothermic reduction process in a thermal plasma jet for rapid silicon production.",
keywords = "Aluminothermic reduction, Silicon production, Tetrachlorosilane, Thermal plasma jet",
author = "Kentaro Shinoda and Hideyuki Murakami and Yoshinari Sawabe and Kunio Saegusa",
note = "Funding Information: A part of this project was financially supported by Sumitomo Chemical Co., Ltd. We would like to thank Dr. Takeshi Yoshikawa, the University of Tokyo, and Dr. Nobuo Hara, the National Institute of Advanced Industrial Science and Technology, for valuable discussion on the refining of Si from Si–Al melts and the rate kinetics, respectively. We also appreciate the support provided by Ms. Kaori Nakane, Mr. Akihiro Yamaguchi, Mr. Yoshito Yasui, and Mr. Ryohei Tansho in the experiments.",
year = "2012",
month = aug,
day = "1",
doi = "10.1016/j.cej.2012.05.093",
language = "English",
volume = "198-199",
pages = "61--64",
journal = "Chemical Engineering Journal",
issn = "1385-8947",
publisher = "Elsevier",
}