Ultrafast production of silicon via aluminothermic reduction of tetrachlorosilane in a thermal plasma jet

Kentaro Shinoda*, Hideyuki Murakami, Yoshinari Sawabe, Kunio Saegusa

*この研究の対応する著者

研究成果: Article査読

7 被引用数 (Scopus)

抄録

This paper proposed a new route for producing silicon at a high rate via the reduction of tetrachlorosilane with aluminum molten particles by utilizing a thermal plasma jet. High-purity aluminum particles melted and sprayed by an atmospheric dc plasma jet were reacted with tetrachlorosilane vapor. Silicon generation was confirmed in the reacted particles. The residence time was calculated to be a few milliseconds. The obtained results demonstrate the feasibility of the aluminothermic reduction process in a thermal plasma jet for rapid silicon production.

本文言語English
ページ(範囲)61-64
ページ数4
ジャーナルChemical Engineering Journal
198-199
DOI
出版ステータスPublished - 2012 8月 1
外部発表はい

ASJC Scopus subject areas

  • 化学 (全般)
  • 環境化学
  • 化学工学(全般)
  • 産業および生産工学

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