Ultraviolet-ozone jet cleaning process of organic surface contamination layers

D. W. Moon*, A. Kurokawa, S. Ichimura, H. W. Lee, I. C. Jeon

*この研究の対応する著者

研究成果: Article査読

51 被引用数 (Scopus)

抄録

To understand the ultraviolet (UV)-ozone jet cleaning process of organic surface contamination layers, adventitious hydrocarbon layers on Si, self-assembled octadecyltrichlorosilane monolayers on Si, and self-assembled C60H-(CH2)12-SH monolayers on Au were cleaned with pure ozone jet and UV irradiation. Cleaned surfaces were analyzed with in situ x-ray photoelectron spectroscopy measurements. Ozone molecules could react with the unsaturated C-C bonds in self-assembled C60H-(CH2)12-SH monolayers on Au surfaces at room temperature. However, the saturated C-C bonds in OTS hydrocarbon molecules adsorbed on Au surfaces reacted not with ozone molecules but with oxygen radicals generated by the dissociation of ozone molecules under UV irradiation. For adventitious carbon contamination on Si surfaces, only a fraction could be cleaned by ozone at room temperature but it could be almost cleaned with UV-ozone jet.

本文言語English
ページ(範囲)150-154
ページ数5
ジャーナルJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
17
1
DOI
出版ステータスPublished - 1999 1 1
外部発表はい

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面および界面
  • 表面、皮膜および薄膜

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