Understanding the stability of a sputtered Al buffer layer for single-walled carbon nanotube forest synthesis

Toshiyuki Ohashi*, Ryogo Kato, Toshio Tokune, Hiroshi Kawarada

*この研究の対応する著者

研究成果査読

13 被引用数 (Scopus)

抄録

We have clarified the reason that aluminum (Al) buffer layers prepared by sputtering on catalytic substrates are stable for single-walled carbon nanotube forest synthesis on chemical vapor deposition. We have focused on the difference between thermal evaporation and sputtering as the method for the preparation of the buffer layers and have analyzed the Al layers using X-ray photoelectron spectroscopy and transmission electron microscopy. Al layers produced by sputtering strongly suggest the formation of γ-alumina by aluminum hydroxides while those from thermal evaporation contain metallic Al. As a result a drastic structural change occurs during thermal annealing, making the buffer layer unstable.

本文言語English
ページ(範囲)401-409
ページ数9
ジャーナルCarbon
57
DOI
出版ステータスPublished - 2013 6

ASJC Scopus subject areas

  • 化学 (全般)
  • 材料科学(全般)

フィンガープリント

「Understanding the stability of a sputtered Al buffer layer for single-walled carbon nanotube forest synthesis」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル