Use of a new anisotropic etching simulator on quartz crystal

M. Zhao, H. Oigawa, J. Wang, J. Ji, T. Ueda

研究成果: Conference contribution

2 被引用数 (Scopus)

抄録

This paper describes features of a new anisotropic etching simulator and its applications on predicting etching shape of quartz crystal. The simulator is suitable to predict etching profiles of two-dimensional initial shape which has a profile formed by straight lines. In this simulator, a program flow with uneven time step was used to furthest reduced the probability of improper shape prediction. We present here two examples of its application on both Z-plate and AT-plate quartz crystal to show its good performance.

本文言語English
ホスト出版物のタイトル2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11
ページ450-453
ページ数4
DOI
出版ステータスPublished - 2011
イベント2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11 - Beijing
継続期間: 2011 6 52011 6 9

Other

Other2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11
CityBeijing
Period11/6/511/6/9

ASJC Scopus subject areas

  • ハードウェアとアーキテクチャ
  • 電子工学および電気工学

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