Use of a new anisotropic etching simulator on quartz crystal

M. Zhao; H. Oigawa; J. Wang; J. Ji; T. Ueda

doi:10.1109/TRANSDUCERS.2011.5969578

Use of a new anisotropic etching simulator on quartz crystal

M. Zhao^*, H. Oigawa, J. Wang, J. Ji, T. Ueda

^*この研究の対応する著者

情報生産システム研究センター

研究成果: Conference contribution

3 被引用数 (Scopus)

抄録

This paper describes features of a new anisotropic etching simulator and its applications on predicting etching shape of quartz crystal. The simulator is suitable to predict etching profiles of two-dimensional initial shape which has a profile formed by straight lines. In this simulator, a program flow with uneven time step was used to furthest reduced the probability of improper shape prediction. We present here two examples of its application on both Z-plate and AT-plate quartz crystal to show its good performance.

本文言語	English
ホスト出版物のタイトル	2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11
ページ	450-453
ページ数	4
DOI	https://doi.org/10.1109/TRANSDUCERS.2011.5969578
出版ステータス	Published - 2011
イベント	2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11 - Beijing 継続期間: 2011 6月 5 → 2011 6月 9

Other

Other	2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11
City	Beijing
Period	11/6/5 → 11/6/9

ASJC Scopus subject areas

ハードウェアとアーキテクチャ
電子工学および電気工学

文献へのアクセス

10.1109/TRANSDUCERS.2011.5969578

他のファイルとリンク

引用スタイル

Zhao, M, Oigawa, H, Wang, J, Ji, J & Ueda, T 2011, Use of a new anisotropic etching simulator on quartz crystal. in 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11., 5969578, pp. 450-453, 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11, Beijing, 11/6/5. https://doi.org/10.1109/TRANSDUCERS.2011.5969578

@inproceedings{c0b1c22cadf84303ab20c8c36b3d9150,

title = "Use of a new anisotropic etching simulator on quartz crystal",

abstract = "This paper describes features of a new anisotropic etching simulator and its applications on predicting etching shape of quartz crystal. The simulator is suitable to predict etching profiles of two-dimensional initial shape which has a profile formed by straight lines. In this simulator, a program flow with uneven time step was used to furthest reduced the probability of improper shape prediction. We present here two examples of its application on both Z-plate and AT-plate quartz crystal to show its good performance.",

keywords = "anisotropic etching, Micromaching, quartz crystal",

author = "M. Zhao and H. Oigawa and J. Wang and J. Ji and T. Ueda",

year = "2011",

doi = "10.1109/TRANSDUCERS.2011.5969578",

language = "English",

isbn = "9781457701573",

pages = "450--453",

booktitle = "2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11",

note = "2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11 ; Conference date: 05-06-2011 Through 09-06-2011",

}

TY - GEN

T1 - Use of a new anisotropic etching simulator on quartz crystal

AU - Zhao, M.

AU - Oigawa, H.

AU - Wang, J.

AU - Ji, J.

AU - Ueda, T.

PY - 2011

Y1 - 2011

N2 - This paper describes features of a new anisotropic etching simulator and its applications on predicting etching shape of quartz crystal. The simulator is suitable to predict etching profiles of two-dimensional initial shape which has a profile formed by straight lines. In this simulator, a program flow with uneven time step was used to furthest reduced the probability of improper shape prediction. We present here two examples of its application on both Z-plate and AT-plate quartz crystal to show its good performance.

AB - This paper describes features of a new anisotropic etching simulator and its applications on predicting etching shape of quartz crystal. The simulator is suitable to predict etching profiles of two-dimensional initial shape which has a profile formed by straight lines. In this simulator, a program flow with uneven time step was used to furthest reduced the probability of improper shape prediction. We present here two examples of its application on both Z-plate and AT-plate quartz crystal to show its good performance.

KW - anisotropic etching

KW - Micromaching

KW - quartz crystal

UR - http://www.scopus.com/inward/record.url?scp=80052113311&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=80052113311&partnerID=8YFLogxK

U2 - 10.1109/TRANSDUCERS.2011.5969578

DO - 10.1109/TRANSDUCERS.2011.5969578

M3 - Conference contribution

AN - SCOPUS:80052113311

SN - 9781457701573

SP - 450

EP - 453

BT - 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11

T2 - 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11

Y2 - 5 June 2011 through 9 June 2011

ER -

Use of a new anisotropic etching simulator on quartz crystal

抄録

Other

ASJC Scopus subject areas

文献へのアクセス

他のファイルとリンク

フィンガープリント

引用スタイル