Use of process indices for simplification of the description of vapor deposition systems

Yuya Kajikawa*, Suguru Noda, Hiroshi Komiyama

*この研究の対応する著者

研究成果: Article査読

8 被引用数 (Scopus)

抄録

Vapor deposition is a complex process, including gas-phase, surface, and solid-phase phenomena. Because of the complexity of chemical and physical processes occurring in vapor deposition processes, it is difficult to form a comprehensive, fundamental understanding of vapor deposition and to control such systems for obtaining desirable structures and performance. To overcome this difficulty, we present a method for simplifying the complex description of such systems. One simplification method is to separate complex systems into multiple elements, and determine which of these are important elements. We call this method abridgement. The abridgement method retains only the dominant processes in a description of the system, and discards the others. Abridgement can be achieved by using process indices to evaluate the relative importance of the elementary processes. We describe the formulation and use of these process indices through examples of the growth of continuous films, initial deposition processes, and the formation of the preferred orientation of polycrystalline films. In this paper, we propose a method for representing complex vapor deposition processes as a set of simpler processes.

本文言語English
ページ(範囲)156-163
ページ数8
ジャーナルMaterials Science and Engineering B: Solid-State Materials for Advanced Technology
111
2-3
DOI
出版ステータスPublished - 2004 8 25
外部発表はい

ASJC Scopus subject areas

  • 材料科学(全般)
  • 凝縮系物理学
  • 材料力学
  • 機械工学

フィンガープリント

「Use of process indices for simplification of the description of vapor deposition systems」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。

引用スタイル