UV nanoimprint lithography and its application for nanodevices

Makoto Fukuhara, Hiroshi Ono, Tamano Hirasawa, Makoto Otaguchi, Nobuji Sakai, Jun Mizuno, Shuichi Shoji

研究成果: Article査読

10 被引用数 (Scopus)

抄録

Nanostructure fabrication process using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition were proposed. This method shows remarkable advantages in high throughput production and fabrication cost. For this process, the newly resin which endures wet process was developed. Co dot arrays of 220nm were fabricated by electrodeposition after UV-NIL. GaN structure of 300nm was also realized using Ni as an etching mask fabricated by proposed process.

本文言語English
ページ(範囲)549-554
ページ数6
ジャーナルJournal of Photopolymer Science and Technology
20
4
DOI
出版ステータスPublished - 2007

ASJC Scopus subject areas

  • Polymers and Plastics
  • Organic Chemistry
  • Materials Chemistry

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