UV nanoimprint lithography and its application for nanodevices

Makoto Fukuhara*, Hiroshi Ono, Tamano Hirasawa, Makoto Otaguchi, Nobuji Sakai, Jun Mizuno, Shuichi Shoji

*この研究の対応する著者

研究成果査読

12 被引用数 (Scopus)

抄録

Nanostructure fabrication process using ultraviolet nanoimprint lithography (UV-NIL) and electrodeposition were proposed. This method shows remarkable advantages in high throughput production and fabrication cost. For this process, the newly resin which endures wet process was developed. Co dot arrays of 220nm were fabricated by electrodeposition after UV-NIL. GaN structure of 300nm was also realized using Ni as an etching mask fabricated by proposed process.

本文言語English
ページ(範囲)549-554
ページ数6
ジャーナルJournal of Photopolymer Science and Technology
20
4
DOI
出版ステータスPublished - 2007

ASJC Scopus subject areas

  • ポリマーおよびプラスチック
  • 有機化学
  • 材料化学

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