Vapor growth of thin heteroepitaxial InP films on CdS

Masahide Inuishi, Bruce W. Wessels

研究成果: Article査読

1 被引用数 (Scopus)

抄録

InP was heteroepitaxially deposited onto CdS single-crystal substrates by chemical vapor deposition using phosphine (PH3), HCl and indium as reactants. Single-crystalline films were deposited at substrate temperatures as low as 450°C. Scanning Auger microscopy shows that the films are InP and that formation of solid solutions between the CdS and the InP is minimal. The as-grown films are n type with residual donor densities of 4 × 1016-4 × 1017 cm-3.

本文言語English
ページ(範囲)195-202
ページ数8
ジャーナルThin Solid Films
88
3
DOI
出版ステータスPublished - 1982 2 19
外部発表はい

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Surfaces and Interfaces
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Materials Chemistry

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