Vapor phase epitaxy of GaN using gallium tri-chloride and ammonia

M. Yuri*, T. Ueda, H. Lee, K. Itoh, Takaaki Baba, J. S. Harris

*この研究の対応する著者

研究成果: Conference contribution

3 被引用数 (Scopus)

抄録

GaN films with good crystalline quality are grown on sapphire by atmospheric pressure vapor phase epitaxy using gallium tri-chloride (GaCl 3) and ammonia (NH 3). Epitaxial growth is carried out over temperature and V/III-ratio ranges of 800-1000°C and 100-1000, respectively. Typical growth rate obtained is in the range of 5-20 μm/hr. The films grown below 925°C typically show three dimensional (island) growth, while above that temperature, continuous films are obtained. Films grown at 975°C with a V/III ratio > 300 exhibit a smooth surface. XRD analysis shows that the films are single crystal with hexagonal polytype. Strong band-edge photoluminescence is observed with a FWHM of 60 meV at room temperature and 25 meV at 77K. The results indicate that this simple growth technique is effective for growing high quality bulk GaN, which can be used as a substrate for subsequent epitaxy. In order to further improve the surface morphology, a preliminary experiment on GaN growth on a thin GaN buffer layer prepared by gas source MBE is also presented.

本文言語English
ホスト出版物のタイトルMaterials Research Society Symposium - Proceedings
編集者R.J. Shul, S.J. Pearton, F. Ren, C.S. Wu
出版社Materials Research Society
ページ195-200
ページ数6
421
出版ステータスPublished - 1996
外部発表はい
イベントProceedings of the 1996 MRS Spring Meeting - San Francisco, CA, USA
継続期間: 1996 4 81996 4 12

Other

OtherProceedings of the 1996 MRS Spring Meeting
CitySan Francisco, CA, USA
Period96/4/896/4/12

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料

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