Very high yield growth of vertically aligned single-walled carbon nanotubes by point-arc microwave plasma CVD

Guofang Zhong; Takayuki Iwasaki; Kotaro Honda; Yukio Furukawa; Iwao Ohdomari; Hiroshi Kawarada

doi:10.1002/cvde.200404197

Very high yield growth of vertically aligned single-walled carbon nanotubes by point-arc microwave plasma CVD

Guofang Zhong^*, Takayuki Iwasaki, Kotaro Honda, Yukio Furukawa, Iwao Ohdomari, Hiroshi Kawarada

^*この研究の対応する著者

研究成果 › 査読

89 被引用数 (Scopus)

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A very high yield growth of extremely dense and vertically aligned single-walled carbon nanotubes (SWNT) by Point-Arc Microwave plasma CVD were analyzed. It was observed that SWNT film thickness increases continuously with the growth time, suggesting an almost unlimited life time for the catalyst. Thin top Al₂O₃ coating plays a very important role in the aligned growth of extremely dense SWNTs. The point-arc MPCVD method is preferable for controlled growth of SWNTs at a low temperature on Si substrates coated with a sandwich-like coating structure.

本文言語	English
ページ（範囲）	127-130
ページ数	4
ジャーナル	Chemical Vapor Deposition
巻	11
号	3
DOI	https://doi.org/10.1002/cvde.200404197
出版ステータス	Published - 2005 3月

ASJC Scopus subject areas

化学 (全般)
表面および界面
プロセス化学およびプロセス工学

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@article{10ccb6a911f94031b53c8efaf2d6b8e7,

title = "Very high yield growth of vertically aligned single-walled carbon nanotubes by point-arc microwave plasma CVD",

abstract = "A very high yield growth of extremely dense and vertically aligned single-walled carbon nanotubes (SWNT) by Point-Arc Microwave plasma CVD were analyzed. It was observed that SWNT film thickness increases continuously with the growth time, suggesting an almost unlimited life time for the catalyst. Thin top Al2O3 coating plays a very important role in the aligned growth of extremely dense SWNTs. The point-arc MPCVD method is preferable for controlled growth of SWNTs at a low temperature on Si substrates coated with a sandwich-like coating structure.",

author = "Guofang Zhong and Takayuki Iwasaki and Kotaro Honda and Yukio Furukawa and Iwao Ohdomari and Hiroshi Kawarada",

year = "2005",

month = mar,

doi = "10.1002/cvde.200404197",

language = "English",

volume = "11",

pages = "127--130",

journal = "Chemical Vapor Deposition",

issn = "0948-1907",

publisher = "Wiley-VCH Verlag",

number = "3",

}

TY - JOUR

T1 - Very high yield growth of vertically aligned single-walled carbon nanotubes by point-arc microwave plasma CVD

AU - Zhong, Guofang

AU - Iwasaki, Takayuki

AU - Honda, Kotaro

AU - Furukawa, Yukio

AU - Ohdomari, Iwao

AU - Kawarada, Hiroshi

PY - 2005/3

Y1 - 2005/3

N2 - A very high yield growth of extremely dense and vertically aligned single-walled carbon nanotubes (SWNT) by Point-Arc Microwave plasma CVD were analyzed. It was observed that SWNT film thickness increases continuously with the growth time, suggesting an almost unlimited life time for the catalyst. Thin top Al2O3 coating plays a very important role in the aligned growth of extremely dense SWNTs. The point-arc MPCVD method is preferable for controlled growth of SWNTs at a low temperature on Si substrates coated with a sandwich-like coating structure.

AB - A very high yield growth of extremely dense and vertically aligned single-walled carbon nanotubes (SWNT) by Point-Arc Microwave plasma CVD were analyzed. It was observed that SWNT film thickness increases continuously with the growth time, suggesting an almost unlimited life time for the catalyst. Thin top Al2O3 coating plays a very important role in the aligned growth of extremely dense SWNTs. The point-arc MPCVD method is preferable for controlled growth of SWNTs at a low temperature on Si substrates coated with a sandwich-like coating structure.

UR - http://www.scopus.com/inward/record.url?scp=21244437565&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=21244437565&partnerID=8YFLogxK

U2 - 10.1002/cvde.200404197

DO - 10.1002/cvde.200404197

M3 - Article

AN - SCOPUS:21244437565

SN - 0948-1907

VL - 11

SP - 127

EP - 130

JO - Chemical Vapor Deposition

JF - Chemical Vapor Deposition

IS - 3

ER -

Very high yield growth of vertically aligned single-walled carbon nanotubes by point-arc microwave plasma CVD

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