Very high yield growth of vertically aligned single-walled carbon nanotubes by point-arc microwave plasma CVD

Guofang Zhong*, Takayuki Iwasaki, Kotaro Honda, Yukio Furukawa, Iwao Ohdomari, Hiroshi Kawarada

*この研究の対応する著者

研究成果: Article査読

89 被引用数 (Scopus)

抄録

A very high yield growth of extremely dense and vertically aligned single-walled carbon nanotubes (SWNT) by Point-Arc Microwave plasma CVD were analyzed. It was observed that SWNT film thickness increases continuously with the growth time, suggesting an almost unlimited life time for the catalyst. Thin top Al2O3 coating plays a very important role in the aligned growth of extremely dense SWNTs. The point-arc MPCVD method is preferable for controlled growth of SWNTs at a low temperature on Si substrates coated with a sandwich-like coating structure.

本文言語English
ページ(範囲)127-130
ページ数4
ジャーナルChemical Vapor Deposition
11
3
DOI
出版ステータスPublished - 2005 3月 1

ASJC Scopus subject areas

  • 化学 (全般)
  • 表面および界面
  • プロセス化学およびプロセス工学

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