Visible-light active thin-film WO3 photocatalyst with controlled high-rate deposition by low-damage reactive-gas-flow sputtering
Nobuto Oka*, Akiyo Murata, Shin Ichi Nakamura, Junjun Jia, Yoshinori Iwabuchi, Hidefumi Kotsubo, Yuzo Shigesato
*この研究の対応する著者
研究成果: Article › 査読
21
被引用数
(Scopus)