Wet etched high aspect ratio microstructures on quartz for MEMS applications

Jinxing Liang*, Fusao Kohsaka, Takahiro Matsuo, Toshitsugu Ueda

*この研究の対応する著者

    研究成果: Article査読

    22 被引用数 (Scopus)

    抄録

    Z cut α-quartz wafers were etched in saturated ammonium bifluoride solution at 87 degrees C. The side wall profiles were observed using the scanning electron microscopy (SEM) and plotted dependent on the polar direction. This research focused on investigating high aspect ratio trench and through-hole, which were dependent on the polar direction to the crystal axis. Aspect ratio in dependence on polar direction was also plotted and microchannels with aspect ratio > 3 could be achieved at the polar angle between 30° to 60°. The possibility of application for microcapillary was discussed, and the trench at 45° was considered best. Double-sided etching technique was used for manufacturing through-hole structures. Through-hole at 0° was demonstrated effective for fabrication of capacitive MEMS tilt sensor. Through-holes at 15° and 105° were proposed for fabrication of 90°-arranged two axis capactive tilt sensor, taking advantage of the twofold symmetry property around X axis and threefold symmetry property around Z axis.

    本文言語English
    ジャーナルIEEJ Transactions on Sensors and Micromachines
    127
    7
    出版ステータスPublished - 2007

    ASJC Scopus subject areas

    • 電子工学および電気工学
    • 機械工学

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