Work function of polycrystalline Ag, Au and Al

M. Uda, A. Nakamura, T. Yamamoto, Y. Fujimoto

研究成果: Article査読

102 被引用数 (Scopus)

抄録

Work functions of polycrystalline Ag, Au and Al films were measured by the photoelectric method, which were deposited on amorphous quartz. These films were preferentially oriented, and an oriented plane, i.e. (111), and a degree of orientation were determined precisely by X-ray diffraction. The work functions of well-defined polycrystalline Ag increased from 4.35 to 4.64 eV after annealing at 500°C, but those of Au and Al remain almost unchanged after annealing at 350°C, i.e. 5.40 and 4.30 eV, respectively. The low work function of Ag before annealing was explained by the appearance of the local density of state near the Fermi edge of Ag, which is due to formation of the stacking fault in f.c.c. Ag during deposition.

本文言語English
ページ(範囲)643-648
ページ数6
ジャーナルJournal of Electron Spectroscopy and Related Phenomena
88-91
DOI
出版ステータスPublished - 1998 3

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 放射線
  • 原子分子物理学および光学
  • 凝縮系物理学
  • 分光学
  • 物理化学および理論化学

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