XPS studies of the chemical and electrochemical behavior of copper in anhydrous hydrogen fluoride

George G. Totir, Gary S. Chottiner, Christopher L. Gross, Daniel Alberto Scherson

研究成果: Article査読

13 被引用数 (Scopus)

抄録

The reactivity of copper toward liquid anhydrous hydrofluoric acid (AHF) has been examined using ex situ X-ray photoelectron spectroscopy (XPS). Exposure of either oxide-free or air-oxidized Cu surfaces to AHF yielded XPS spectra consistent with the presence of a CuF2 layer devoid of oxygen. Cyclic voltammetric experiments involving oxide-free Cu electrodes in hexafluorobutanol (HFB)+AHF displayed a prominent oxidation peak during the first few cycles. XPS analysis of Cu electrodes emersed at potentials positive to this feature provided evidence for the presence of a CuF2 layer much thicker than that found by simple immersion in AHF. Furthermore, the onset potential for both oxidation and subsequent reduction of the film was 0.0 V versus a Cu electrode in the same solution, which suggests that the Cu/CuF2 redox couple controls the potential of the reference electrode.

本文言語English
ページ(範囲)151-156
ページ数6
ジャーナルJournal of Electroanalytical Chemistry
532
1-2
DOI
出版ステータスPublished - 2002 9 6
外部発表はい

ASJC Scopus subject areas

  • Analytical Chemistry
  • Chemical Engineering(all)
  • Electrochemistry

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